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Compact Atmospheric Pressure Microwave Plasma Source

Compact atmospheric pressure microwave plasma source adopts a microwave hybrid mode type resonator developed by fusing the technology of three-dimensional electromagnetic field analysis considering charged particles/plasma and the design technology of high Q high power microwave resonator.
Because power can be supplied by coaxial cable, the setting of the plasma source with high flexibility is enabled, and system constitution with low cost is realized.
Plasma generated under atmospheric pressure is a non-equilibrium plasma, and the low plasma temperature enables plasma processing of the target object while suppressing thermal reactions. Therefore, it is suitable for continuous process (belt conveyor process). In addition, since it is possible to deal with organic matter including ecology, it is expected that a completely new plasma will be applied. In particular, plasma applications in the fields of nanoparticles such as carbon nanotubes, nanotechnology, biotechnology, and medicine have the potential to create new industries.

Applications
 【Industrial】
  • Processing for semiconductor manufacturing
    (Etching / Ashing / Deposition)
  • Desmear processing of via holes on a PCB
  • Processing of liquid crystal panels
  • Surface modification of polyimide and epoxy materials
  • Reduction processing of metal materials
  • Washing after plating
  • Increasing of junction strength
  • Film processing
  • Surface modification of lenses
【Research / Medical / Pharmaceutical / Cosmetics】
  • Nano materials e.g. carbon nanotubes
  • Nano particle synthesis
  • Sterilization and washing
  • Nano particle inactivation
  • Nano particle composition
  • Thin film deposition
  • Organic compound composition

Cavity Type Plasma Source

Features
  • Atmospheric pressure
  • Reduced pressure
Applications
  • Thin film deposition
  • Etching
  • Spectral analysis
  • Sterilization treatment
  • Hydrophilic treatment
Specifications
ModelAPLC024-015/141
Operating Frequency2450MHz
Input Power300W-1kW
Pressure Range300Pa-Atmospheric
GasAr, O2
CoolingWater cooling
Plasma Spout DiameterAPCL024-015(φ20mm)
APCL024-141(φ10mm)
ConnectorWR430 or WR340
Specifications
ModelAPLC024-359
Operating Frequency2450MHz
Input Power100W-300W
Pressure Range300Pa-Atmosheric
GasAr, O2
CoolingWater cooling
Plasma Spout Diameterφ10mm
Connector 7/16 Connector
Connection diagram
APLC024-015
APLC024-141

Waveguide
WR430 or WR340

Stub Tuner
WR340

Waveguide
WR340

Magnetron Generator

Reentrant Type Plasma Source

Features
  • Atmospheric pressure
  • Reduced pressure
Applications
  • Thin film deposition
  • Etching
  • Spectral analysis
  • Sterilization treatment
  • Hydrophilic treatment
Specifications
ModelAPLC024-348
Operating Frequency2450MHz
Input Power50W-100W
Pressure Range1Pa-Atmosheric
GasAr
CoolingAir cooling
Plasma Spout Diameterφ7mm
ConnectorN Connector
Connection diagram

APLC024-348

Coaxial Cable N-N

Stub Tuner N

Coaxial Cable N-N


Solid State Generator
200W

PEN Type Plasma Source

Features
  • Effective for local processing
  • Easy handling
Applications
  • Surface modification
  • Sterilization
Specifications
ModelAPLP024-005
Operating Frequency2450MHz
Input Power50W-100W
Pressure RangeAtmosheric
GasAr
CoolingAir cooling
Plasma Spout Diameterφ2mm
ConnectorN Connector
Connection diagram

APLP024-005

Coaxial Cable N-N

Stub Tuner N

Coaxial Cable N-N


Solid State Generator
200W

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